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    EUV TRACK (HNA/LNA)

    Imec EU Pilot line NV

    EUV TRACK (HNA/LNA)

    1. Questions deadline

      Jan 13, 11:00 AMJanuary 13, 2026 11:00 AM

    2. Tender submission deadline

      Jan 20, 11:00 AMJanuary 20, 2026 11:00 AM

    3. Tender validity period

      Apr 20, 10:00 AMApril 20, 2026 10:00 AM

    4. Result notice published

      Sep 30, 8:00 PMSeptember 30, 2026 8:00 PM

    Brief

    Belgium: Tenders/Imec EU Pilot line NV/EUV TRACK (HNA/LNA)

    Awarded

    The competition has ended and a winner has been selected.

    Brief

    Imec EU Pilot line NV has entered into a framework agreement with Tokyo Electron Europe Limited for the delivery of EUV TRACK (HNA/LNA) equipment in Arr. Leuven, Belgium. This equipment, which falls under laboratory, optical, and precision equipment, will support both High NA and Low NA EUV scanners by preparing wafers through pre-treatment, coating, and post-exposure processing. The track modules require precise control for superior uniformity and the ability to process a wide variety of materials to support semiconductor device scaling. Only one bid was received for this contract.

    Result

    Winner
    Tokyo Electron Europe Limited
    Number of bids
    1
    Contract value
    Not stated
    Maximum framework agreement value
    Up to €0

    About the bid

      The high NA - EUV track will support a High NA EUV scanner it gets linked to. The track will prepare the wafers before the exposure, this is pre-treatment of the wafers before coating, the coating of underlayer and photo resist followed by a post application bake. After exposure the track will execute the post exposure bake and development of the photo sensitive material to get the pattern fixed. The track modules need to be precisely controlled to achieve superior results in uniformity within the wafer and from wafer to wafer. It also needs to enable the processing of a wide variety of materials to support the further scaling and continuous evolving semiconductor devices. The low NA - EUV track will support a Low NA EUV scanner it gets linked to. The track will prepare the wafers before the exposure, this is pre-treatment of the wafers before coating, the coating of underlayer and photo resist followed by a post application bake. After exposure the track will execute the post exposure bake and development of the photo sensitive material to get the pattern fixed. The track modules need to be precisely controlled to achieve superior results in uniformity within the wafer and from wafer to wafer. It also needs to enable the processing of a wide variety of materials to support the further scaling and continuous evolving semiconductor devices.

      Contact phone
      +32 16287789
      Contact email
      tom.wauters@imec.be
      Address
      Kapeldreef 75, 3001 Heverlee

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    Award Criteria

    • Description

      See tender documents

    Qualification requirements

      Found no qualification requirements in the contract notice.

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    See the full notice

    Contracting authority
    Imec EU Pilot line NV
    Title
    EUV TRACK (HNA/LNA)
    Type
    ResultFramework agreementPrequalification
    Main code
    38000000Laboratory, optical and precision equipments (excl. glasses)
    Supplemental codes

    No supplemental codes from buyer…

    Supplemental codes added by Cobrief

    38600000Optical instruments
    38800000Industrial process control equipment and remote-control equipment
    38810000Industrial process control equipment
    Location
    Arr. Leuven

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