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    Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) System

    Oulun yliopisto

    Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) System

    1. Planning notice published

      Jun 25, 7:54 AMJune 25, 2026 7:54 AM

    2. Qualification deadline

      Aug 10, 8:59 PMAugust 10, 2026 8:59 PM

    Brief

    Finland: Tenders/Oulun yliopisto/Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) System

    Planned

    The competition has not been announced yet.

    Deadline
    Aug 10,Expired
    Procedure
    OpenSingle stage
    Agreement
    Buying goodsover 1 year

    Brief

    Oulun yliopisto valmistelee induktiivisesti kytketyn plasman reaktiivisen ionietsausjärjestelmän (ICP-RIE) hankintaa, jota käytetään mikrorakenteiden valmistukseen tieteellisessä tutkimuksessa. Järjestelmän toimitus on kestoltaan 1 vuoden. Toimittajia pyydetään ottamaan yhteyttä hankintayksikköön osoitteeseen hankinnat@oulu.fi dialogin järjestämiseksi.

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    • Description

      Technical properties and services related to the ICP-RIE system

      Source

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    • Who are you up against?

      The suppliers who have won similar contracts at Oulun yliopisto

    From the notice

    • University of Oulu is preparing a purchase of an inductively coupled plasma reactive ion etching (ICP-RIE) system. The system will be used in scientific research to fabricate microstructures for various applications, such as biomedicine, sensor technology, and optics. For more information, please contact the contracting unit to organize a dialogue by 10.8.2026 at the address: hankinnat@oulu.fi. Please note that contracting authority is on summer holiday during 11.7.-2.8.2026.

    • Contact

      Procurement Serviceshankinnat@oulu.fi
    • Type
      Planning
    • Main code
      Laboratory, optical and precision equipments (excl. glasses)
      38000000
    • 38430000Detection and analysis apparatus38500000Checking and testing apparatus38970000Research, testing and scientific technical simulator

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