Plasma Enhanced Atomatic Deposition System
Awarded
The competition has ended and a winner has been selected.
The Product should coat layers with high uniformity and structures with high aspect ratios. It should be possible to tune the optical properties, density and stress in the films by adjusting deposition parameters. The The The Product should be capable of depositing the following materials: Al2O3, TiO2, ZnO, In2O3, SnO2, NiOx, SiO2 and HfO2, with the option to easily switch to different materials, such as nitrides like AlN and TiN and metallic layers like Pt and Ru. 1 plasma enhanced atomic disposition system
Result
- Winner
- Veeco GmbH
- Number of bids
- 2
- Contract value
- €549,999
About the bid
- Contact name
- Rob Ruiter
- Contact phone
- +31 46237417
- Contact email
- r.ruiter@nwo.nl
- Address
- Winthontlaan 2, 3526KV UTRECHT
The Product should coat layers with high uniformity and structures with high aspect ratios. It should be possible to tune the optical properties, density and stress in the films by adjusting deposition parameters. The The The Product should be capable of depositing the following materials: Al2O3, TiO2, ZnO, In2O3, SnO2, NiOx, SiO2 and HfO2, with the option to easily switch to different materials, such as nitrides like AlN and TiN and metallic layers like Pt and Ru. 1 plasma enhanced atomic disposition systemMain features of the procedureEuropean Open procedure
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Award Criteria
Description
Quality criteria Q1-Q6
Description
The lowest comparison price being the result of the registration price after the fictitious deduction in Euro earned on the quality criteria
Qualification requirements
Found no qualification requirements in the contract notice.
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See the full notice
- Contracting authority
- Stichting Nederlandse Wetenschappelijk Onderzoek Instituten (NWO-I)
- Title
- Plasma Enhanced Atomatic Deposition System
- Type
- Main code
- Supplemental codes
- Estimated value
- €550,000.00
- Duration
- 60 months
No supplemental codes from buyer…