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    High-vacuum chamber for thin-film synthesis

    University of Helsinki

    High-vacuum chamber for thin-film synthesis

    1. Competition notice published

      Oct 21, 2025 7:33 AMOctober 21, 2025 7:33 AM

    2. Supplier selection

      Nov 26, 2025 12:00 AMNovember 26, 2025 12:00 AM

    3. Contract signed

      Dec 9, 2025 12:00 AMDecember 9, 2025 12:00 AM

    4. Result notice published

      Dec 18, 2025 9:00 AMDecember 18, 2025 9:00 AM

    Brief

    Finland: Tenders/University of Helsinki/High-vacuum chamber for thin-film synthesis

    Awarded

    The competition has ended and a winner has been selected.

    Deadline
    Dec 17, 2025Expired
    Award
    The total price 40% and 2 more
    Procedure
    OpenSingle stage
    Agreement
    Buying goodsover 3 months

    Brief

    University of Helsinki har inngått en avtale med PREVAC sp. z o.o. om å levere et høyvakuumkammer for tynnfilmsyntese til Helsinki Accelerator Laboratory (HAL) i Helsingfors. Kammeret skal kunne håndtere substrater med en diameter på opptil 8 tommer (203,2 mm) og støtte magnetronforstøvning i DCMS-, RFMS- og HiPIMS-moduser. Kontrakten har en verdi på 277 890 euro og en varighet på 3 måneder. Det ble lagt vekt på teknisk ytelse og vitenskapelig potensial (40%), pris (40%), service, support og garanti (10%), samt leveringstid (10%).

    Laboratorie- og analyseutstyr

    Result

    TED
    • PREVAC sp. z o.o.
      Winner
    • Number of bids
      1
    • Contract value
      €277,890

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    Award Criteria

    • Description

      Technical performance and scientific potential of the proposed solution. Detailed specifications are in the Annex 2 in the Call for tenders. For each “should”, “describe” and “specify” request the evaluation of the tender will give a certain number of points, shown by the numbers within parentheses. Points will be given in accordance with the intervals stated in section 3. Then the tenders will receive a mark between 0 and 100 for the criterion, based on the formula below.

      Evaluation Method

      Points will be given in accordance with the intervals stated in section 3.

      Source

      No source found in the documents. Check the weight against the tender documents.

    • Description

      The total price (VAT 0 %) for the offered system in EUR, maximum 285 000 euros, including delivery costs, installation of the equipment so that it is fully operational, tests, user and maintenance instructions, training, insurance until final acceptance of device and offered warranty period.

      Evaluation Method

      Tenders will be ranked with regards to the lowest total price offered. The total price criterion will be differentiated in a scale of marks where highest mark, 100, is given for the lowest total price and the remaining tenders will be given marks in relation to the lowest price as stated below.

      Source

      No source found in the documents. Check the weight against the tender documents.

    • Description

      Tenders will be evaluated with regards to Service and support, as well as warranty. Points will be given in accordance with the intervals stated at each requirement in Section 6. The tenders will receive a mark between 0 and 100 for the criterion, based on the formula below.

      Evaluation Method

      Points will be given in accordance with the intervals stated at each requirement in Section 6.

      Source

      No source found in the documents. Check the weight against the tender documents.

    • Description

      Tenders will be ranked with regards to the shortest delivery and installation time. Points will be given in accordance with the interval stated in the specification document (Annex 2 in the Call for tenders) section 4. The tenders will receive a mark between 0 and 100 for the criterion, based on the formula below.

      Evaluation Method

      Points will be given in accordance with the interval stated in the specification document (Annex 2 in the Call for tenders) section 4.

      Source

      No source found in the documents. Check the weight against the tender documents.

    Previous winners

    • Who are you up against?

      The suppliers who have won similar contracts at University of Helsinki

    From the notice

    • The Helsinki Accelerator Laboratory (HAL) at the Department of Physics of the University of Helsinki (UH) is going to acquire a multi-source high vacuum (HV) chamber for thin-film deposition using magnetron sputtering. The magnetron sources will be capable of operating in direct-current magnetron sputtering (DCMS), radio-frequency magnetron sputtering (RFMS), and high-power impulse magnetron sputtering (HiPIMS) modes. Key feature of the deposition chamber will be the ability to accommodate and deposited homogeneously on substrates with diameter up to 8 inches (203.2 mm). A quick access port for loading and unloading substrates with a diameter up to 8 inches (203.2 nm) to the deposition chamber will be available. Moreover, the chamber design will allow provisionally for future functional expansion including installing a thermal evaporator for thin film deposition and a load-lock chamber for transferring samples to the deposition chamber without vacuum cycle interruption. RFMS and HiPIM power supplies, as well as instrumentation for thin film thermal evaporation, and load-lock chamber are not part of this tender. HAL is a leading materials science environment in Finland. The current research at HAL focuses on materials of importance for nanotechnology, micro- and optoelectronics, fusion technology, and particle detectors. Material properties are studied by applying various ion beam-based techniques, as well as by computational means. With regards to thin-film synthesis, the HAL laboratory installations presently feature two ultra-high vacuum magnetron sputtering systems used by faculty members, post-doctoral researchers, Ph.D. students, M.Sc. students, and B.Sc. students for fundamental and applied research in the core areas of interest for HAL With the deposition system described herein, HAL seeks to expand its capabilities with regards to synthesis of thin-film materials via magnetron sputtering on substrate sizes and conditions commensurate with industrial processes. The deposition system will primarily be a research and development tool to synthesize elemental and multicomponent thin films, including metals and multi-component alloys thereof, metallic glasses, semiconductors, insulators, magnetic materials, metal nitrides, metal oxides, and metal carbides. Moreover, the deposition system will provide full flexibility for tuning temporal profile of the deposition flux, deposition flux energy, gas flow, substrate temperature, substrate rotation, and deposition geometry. These features will enable to control growth kinetics on large scale wafers and other substrates. Also, ability to perform in situ film characterization by means of e.g., spectroscopic ellipsometry and stress analysis, as well as possibility for in situ plasma analysis is an option. The system will be used by faculty members, senior researchers, post-doctoral researchers, PhD students, M.Sc. students, and B.Sc. students, as well as other researchers who have a professional connection HAL and its ongoing research activities. A detailed technical specification, stating the minimum requirements for the deposition system to fulfill its scope is given in Appendix 2. Manufacturers are, however, encouraged to suggest additional features to better fulfill the scope of this tender.

    • Contact

      Hankinnathankinnat@helsinki.fi
    • Type
      Result
    • Location
      Helsinki-Uusimaa
    • Main code
      Laboratory, optical and precision equipments (excl. glasses)
      38000000
    • 38400000Instruments for checking physical characteristics38430000Detection and analysis apparatus42942200Vacuum ovens

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