Vorinformation – Beschaffung eines Atomic Layer Etching Systems

Vorinformation – Beschaffung eines Elektronenstrahl-Verdampfungssystems für Halbleiterprozesse

Die Ferdinand-Braun-Institut gGmbH, Leibniz-Institut für Höchstfrequenztechnik, plant die Beschaffung eines Elektronenstrahl-Verdampfungssystems zur Metallabscheidung auf Substraten bis 200 mm Durchmesser, um die Prozessmöglichkeiten in der Halbleiter- und Photoniktechnologie zu erweitern. Es handelt sich um die Lieferung einer Anlage im Rahmen des Projekts APECS. Der geschätzte maximale Gesamtauftragswert beträgt 1.386.000 EUR.

Prior Information Notice – Maskless Laser Lithography System

Ferdinand-Braun-Institut gGmbH, Leibniz-Institut für Höchstfrequenztechnik is planning the procurement of a high-performance maskless laser lithography system for high-resolution patterning of semiconductor wafers to support the development of advanced heterointegration technologies. The system must provide sub-micron precision combined with high throughput, support modern multi-beam laser writing technologies, and comply with ISO class 5 requirements for installation in a cleanroom environment. The estimated maximum total contract value is 510,000 EUR.

Prior Information Notice – Laser Manufacturing System for Wafer Processing

Ferdinand-Braun-Institut gGmbH, Leibniz-Institut für Höchstfrequenztechnik is planning the procurement of a laser-based manufacturing system for advanced wafer processing, which will be used for various opto-mechanical processing steps including wafer dicing, laser ablation of thin layers, via drilling for backside processes, and laser-based decomposition of bonding layers. The system must be capable of processing different semiconductor materials such as SiC, GaN, Si, GaAs and InP for wafer sizes up to 200 mm, and comply with ISO class 5 requirements, including laser protection class 1. The estimated maximum total contract value is 1,292,000 EUR.

FBH-02 Prior Information Notice – Wet Chemical Processing Tool (Single Wafer Etching)

Ferdinand-Braun-Institut gGmbH, Leibniz-Institut für Höchstfrequenztechnik is planning the procurement of a wet chemical processing tool for single wafer etching, intended for processing compound semiconductor materials like InP, GaAs, AlGaAs, and GaN. The tool must enable highly precise and reproducible etching processes on a per-wafer basis, including endpoint detection functionality, and be compatible with ISO class 5 cleanroom requirements. The estimated maximum total contract value is 1,710,000 EUR.

Prior Information Notice – Sputter Deposition

Ferdinand-Braun-Institut gGmbH, Leibniz-Institut für Höchstfrequenztechnik is planning the procurement of a sputter deposition system for depositing metallic and insulating thin films on semiconductor wafers up to 200 mm in diameter, to support advanced heterogeneous integration technologies. The system needs to be a multi-chamber cluster system with integrated cleaning and deposition capabilities, compatible with semiconductor manufacturing requirements for installation in a cleanroom environment. The estimated maximum total contract value is 4,128,000 EUR.