European Tender Electron Beam Lithography system
Expired
The competition has expired without a winner being announced.
Laboratorie-, optisk- og presisjonsutstyr
De Universiteit Twente heeft een aanbesteding uitgeschreven voor de aankoop van een elektronenbundellithografiesysteem. Dit systeem, met een maximale totale waarde van 3,5 miljoen euro, is bedoeld voor het MESA+ Instituut en moet patronen kunnen definiëren in elektrongevoelige resists met hoge resolutie en snelheid. Het systeem moet compatibel zijn met diverse toepassingen en substraten tot 200 mm diameter, en zal worden gebruikt door academische onderzoekers, studenten en industriële ingenieurs met verschillende achtergronden en expertiseniveaus.
About the bid
- Contact name
- Camilio Delfgaauw
- Contact phone
- +31534891512
- Contact email
- c.delfgaauw@utwente.nl
- Address
- Drienerlolaan 5, 7522NB Enschede
The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users, i.e. academic researchers and students as well as industrial engineers with different backgrounds (photonics, (nano)-electronics etc.) and different levels of expertise.
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See the full notice
- Contracting authority
- Universiteit Twente
- Title
- European Tender Electron Beam Lithography system
- Type
- Main code
- Supplemental codes
- Estimated value
- €3,500,000.00