III-V ICP Etcher
Awarded
The competition has ended and a winner has been selected.
- Deadline
- Nov 30, 2025Expired
- Award
- Quality of submitted samples and performance evaluation 40% and 1 more
Brief
Danmarks Tekniske Universitet - DTU har inngått en avtale med Samco Inc om å levere en ICP reaktiv ion etser for etsing av III-V materialer, med spesielt fokus på etsing av GaAs mikropillarenheter fra et plant mikrohulrom. Leveransen skal skje i Københavns omegn, med en prosjektvarighet på 12 måneder og en total verdi på 607 100 €. Det ble lagt vekt på maskinvare, funksjonalitet, tjenester og kvaliteten på innsendte prøver.
Result
- Samco IncWinner
- 4Number of bids
- €607,100Contract value
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Award Criteria
Description
DTU Nanolab will assess if the tender fulfils the specified evaluation requirements to sub-criterion “Quality of submitted samples”, and sub-criteria “Functionality and performance” is based on the Tenderer’s specifications in Appendix 1 – Requirement Specification.
Source
No source found in the documents. Check the weight against the tender documents.
Description
The performance evaluation is based on the returned samples: The provided samples shall show evidence of the Tenderers tool's capability of covering the processing requirements based on the process descriptions in the Appendix 3. DTU Nanolab will assess whether the submitted samples fulfil the specified evaluation requirements as defined in Appendix 3. Based on the assessment of fulfilments, points are awarded on the above-mentioned scale of 0-10. If the Tenderer has already submitted such demo samples, the Tenderer can refer to such submitted Demo samples instead of providing new samples.
Evaluation Method
Based on the assessment of fulfilments, points are awarded on the above-mentioned scale of 0-10.
Source
No source found in the documents. Check the weight against the tender documents.
Description
The price to be evaluated is the total price for the machines as well as the options, but not voluntary option, specified in Appendix 2 – Prices.
Source
No source found in the documents. Check the weight against the tender documents.
Previous winners
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From the notice
DTU requires an ICP reactive ion etcher to etch III-V materials with a special focus on etching GaAs micropillar devices from a planar microcavity (“the Instrument”). The system is expected to be delivered as soon as possible but at the latest in Q3 2026. The Instrument is to be the core instrument for a research project on optical devices. Besides that, it will be part of the shared open access instruments at the facility supporting research in micro and nano fabrication within optical devices and quantum computer developments. Therefore, DTU need a state-of-the-art instrument that can meet all current and future needs for etching III-V materials like GaAs, AlGaAs, InGaAs, AlInGaAsP and InP .
Contact
Anna Storchaasst@dtu.dk- ResultType
- Københavns omegnLocation
- 38000000Main codeLaboratory, optical and precision equipments (excl. glasses)
- 51430000Installation services of laboratory equipment