Deep Reaction Ion Etcher (DRIE)

Uppsala universitet needs a Deep Reaction Ion Etcher (DRIE) for their Myfab Uppsala laboratory. The system will be used by many operators in a university laboratory environment and must be easy to use and insensitive to frequent process changes between batches. It needs to support a broad range of etching capabilities, including low to high etch rates, wafer dicing, high uniformity, high open area, high aspect ratio, and nanometre scale, for etching silicon and other compatible materials using photoresist resins and hard masks. The maximum total contract value is 1 SEK.

High Temperature 200 mm Ion Implanter - PR1293607-2790-W

Fraunhofer-Gesellschaft - Einkauf B12 needs a High Temperature 200 mm Ion Implanter for delivery in Erlangen, Kreisfreie Stadt, over a duration of 12 months. The award criteria are Technical Details (65%) and Price (35%). Suppliers must provide information on turnover for the last 3 financial years.

Fertigung von ROS-Elektronik-Baugruppen für Tscherenkow-Kameras

Das Max-Planck-Institut für Kernphysik benötigt die Fertigung von ROS-Elektronik-Baugruppen für Tscherenkow-Kameras. Die Lieferung der Güter soll in Heidelberg erfolgen und der Vertrag hat eine Laufzeit von 15 Monaten.

STANDARD AND TECHNICAL SPECIFICATIONS TO GOVERN THE CONTRACT FOR THE SUPPLY AND INSTALLATION OF AN INDUCTIVELY COUPLED PLASMA REACTIVE ION ETCHING (ICP-RIE) SYSTEM

INL - INTERNATIONAL IBERIAN NANOTECHNOLOGY LABORATORY needs the supply and installation of a high-performance Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) system for micro- and nanofabrication. The contract involves the supply, installation, commissioning, acceptance testing, and training related to this scientific equipment, which will be delivered in Cávado, Portugal.

Delivery and installation of a High ion density etcher for lithium niobate on insulator - LiNb03 (LN)

Danmarks Tekniske Universitet - DTU needs a high ion density etcher for lithium niobate on insulator 150 mm wafer processing, to be delivered and installed in the DTU Nanolab cleanroom in Nordsjælland no later than Q4 2027. The instrument must be highly versatile, providing stable etch recipes capable of etching at both nanometer and micrometer scales with precise depth control, and state-of-the-art performance in profile control, uniformity, selectivity, and sidewall smoothness for low waveguide loss. The award criteria are Price (20%) and Quality, Functionality and Performance (80%). Tenderers must provide at least 3 relevant references, not more than 5 years old, for comparable agreements involving the delivery, installation, and servicing of a substantially equivalent High ion density plasma etcher for etching of lithium niobate on insulator.