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    Deep Reaction Ion Etcher (DRIE)

    Uppsala universitet

    Deep Reaction Ion Etcher (DRIE)

    1. Competition notice published

      Oct 6, 12:07 PMOctober 6, 2026 12:07 PM

    2. Change in competition

      Oct 9, 10:14 AMOctober 9, 2026 10:14 AM

    3. Tender submission deadline

      Nov 9, 11:00 PMNovember 9, 2026 11:00 PM

    4. Contract start date

      Dec 15, 12:00 AMDecember 15, 2026 12:00 AM

    5. Tender validity period

      Feb 9, 2027 11:00 PMFebruary 9, 2027 11:00 PM

    6. Contract end date

      Dec 14, 2037 12:00 AMDecember 14, 2037 12:00 AM

    Brief

    Sweden: Tenders/Uppsala universitet/Deep Reaction Ion Etcher (DRIE)
    Brief

    Anleggsmaskiner og utstyr

    Uppsala universitet needs a Deep Reaction Ion Etcher (DRIE) for their Myfab Uppsala laboratory. The system will be used by many operators in a university laboratory environment and must be easy to use and insensitive to frequent process changes between batches. It needs to support a broad range of etching capabilities, including low to high etch rates, wafer dicing, high uniformity, high open area, high aspect ratio, and nanometre scale, for etching silicon and other compatible materials using photoresist resins and hard masks. The maximum total contract value is 1 SEK.

    About the bid

      Myfab Uppsala aims at purchasing a Deep Reaction Ion Etcher (DRIE). The purpose of the tool is to transfer patterns defined by e.g., photo- and electron beam lithography covering the pattens size range from all substrate range down to a few nanometres. The system will be used by many operators in a university laboratory environment. It must be easy to use and be insensitive to frequent change of process between batches. The processes include broad range of etching capability: low to high etch rate, wafer dicing, high uniformity, high open area, high aspect ratio, and nanometre scale. The system is intended for etching of silicon as well as other materials compatible with silicon etching, with both photoresist resins and hard masks for patterning.

      Contact phone
      018-471 00 00
      Contact email
      info@uu.se
      Address
      Dag Hammarskjölds Väg 7, 752 37 Uppsala

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    See the full notice

    Contracting authority
    Uppsala universitet
    Title
    Deep Reaction Ion Etcher (DRIE)
    Type
    CompetitionPrequalification
    Main code
    42000000Industrial machinery
    Supplemental codes

    No supplemental codes from buyer…

    Supplemental codes added by Cobrief

    42900000Miscellaneous general and special-purpose machinery
    Location
    Uppsala län
    Estimated value
    SEK 1.00

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