Electron beam lithography (EBL) and laser beam lithography (LBL) systems

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Brief

Laboratorieutstyr og analyseinstrumenter

Jyväskylän yliopisto har inngått en avtale med Raith GmbH om å levere en kombinasjon av et elektronstrålelitografi (EBL) og et laserstrålelitografi (LBL) system, begge kapable til "mix-and-match" prosessering basert på CAD-tegninger i GDSII filformat, til Keski-Suomi. Systemene skal brukes til forskning og utvikling av mikro- og nanoskala funksjoner som krever høy nøyaktighet i mønsterdannelse og kantglatthet, med en total verdi på 1 265 000 euro. Det var krav om at de to litografisystemene skulle ha god støtte for "mix-and-match" litografi, med veldokumenterte prosedyrer for deling av CAD-mønsterbiblioteker for enkel implementering i "mix-and-match" eksponeringer på samme resistlag, og at EBL- og LBL-systemene skulle håndtere "mix-and-match" eksponeringer med resister som Shipley S1813, SU-8 og AZ5200-E serier. Det deltok 1 leverandør i konkurransen.

Result

Winner
Raith GmbH
Number of bids: 1
Contract value: €1,265,000

About the bid

University of Jyväskylä (JYU) is inviting tenders for a combination of an electron beam lithography system (EBL) and a laser beam lithography system (LBL), both capable of mix-and-match processing based on CAD drawings in GDSII file format. We are searching a Dedicated EBL tool AND a Dedicated LBL tool for research and development of state of the art micro- and nano-scale features requiring high fidelity in patterning and edge smoothness. Contracting authority has a need for high precision and versatile lithography tools for patterning of optical wave guides and lattices, phononic crystals and mechanic resonators; with the goal of investigating quantum phenomena and the interplay between such structures. Contracting authority has a need for the lithography tools to support integration of high fidelity nano-scale features into considerably larger designs, such as microfluidic networks with widths of about 100 um and lengths of several mm. Therefore, contracting authority puts emphasis on the two lithography systems having good support for mix-and-match lithography, i.e. well documented procedures for sharing CAD pattern libraries for straightforward implementation in mix-and-match exposures on the same resist layer. The EBL and LBL systems should manage mix-and-match exposures with resists such as Shipley S1813, SU-8 and AZ5200-E series.Main features of the procedureIn an open procedure the contracting entity publishes a contract notice and places a call for tenders for the receivable, on which basis all prospective suppliers may submit their tenders. After the contract notice has been published and the call for tenders has been placed, the contracting entity may send the call for tenders to the suppliers that it considers suitable. A contracting entity may conclude a procurement agreement in the form of separate lots and may determine the size and subject-matter of such lots. Tenders must be submitted for both of the lots (EBL and LBL),

Contact name: Hankintapalvelut
Contact phone: +358 0142601211
Contact email: hankinnat@jyu.fi
Address: Seminaarinkatu 15, 40014 Jyväskylän yliopisto

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See the full notice

Contracting authority: Jyväskylän yliopisto
Title: Electron beam lithography (EBL) and laser beam lithography (LBL) systems
Type
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Location: Keski-Suomi

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